Fundamental and Fine Processing Correspondence in Wet Etching and Development of Advanced Material Applications
What is the cutting-edge etching for the formation of transparent electrode patterns for next-generation power device substrates, touch panels, and fine-pitch electronic components?!
**Lecturer** Mr. Kimihiko Ikeda, Head of the Implementation Materials Research Laboratory, Electronic Materials Development Research Institute, Research and Development Division, ADEKA Corporation **Target Audience** Engineers, researchers, and beginners interested in wet processes and wet etching technology **Venue** Tokyo Chuo Ward Industrial Hall, 4th Floor, Meeting Room 4 [Tokyo, Nihonbashi] 5 minutes from B4 exit via underground passage from Bakuroyokoyama Station on the Toei Shinjuku Line (Directions 2) 5 minutes from C1 exit via East Exit ticket gate from Bakurocho Station on the JR Sobu Rapid Line (Directions 3) **Date and Time** December 26, 2011 (Monday) 13:30-16:30 **Capacity** 20 participants. *Registration will close once full. Please apply early.* **Participation Fee** **[Early Bird Discount Price]** 46,200 yen (tax included, including text costs) for up to 2 participants from one company. *Limited to Tech-Zone members who apply by December 12. Membership registration is free.* *After December 12, the [Regular Price] will be 49,350 yen (tax included, including text costs) for up to 2 participants from one company.*
- Company：AndTech
- Price：10,000 yen-100,000 yen
